[17p-C31-1~20] 12.7 Biomedical Engineering and Biochips

5:30 PM - 5:45 PM JST(8:30 AM - 8:45 AM UTC)

[17p-C31-16] Investigation of the sensitive-membrane formation process to improve the spatial resolution for CMOS multichemical image sensors

〇hideo doi¹, Jumnpei Otsuka¹, Tomoko Horio¹, Yong-Joon Choi¹, Kazuhiro Takahashi¹, Toshihiko Noda¹, Kazuaki Sawada¹ (1.Toyohashi Univ.)

Keywords:

CMOS multichemical image sensor,Taitanium nitride,Redox

Toward the high-resolution imaging of chemical substances, the sensitive-membrane formation process for CMOS multichemical image sensor was investigated. Using semiconductor lithography, the gold electrode smaller than a pixel size was patterned every pixel on the 4.19 µm-pitch array sensor deposited with an electrically conductive Titanium nitride (TiN), and the selective redox and pH responses were demonstrated. Based on the simultaneous visualization experiment for redox and pH, the output image of the sensor was clearly changed, reflecting the Au patterns on the array. We succeeded in improving the spatial resolution of a multichemical image sensor.