[18p-D62-1~17] CS.1 Code-sharing Session of 2.3 & 7.4

1:30 PM - 1:45 PM JST(4:30 AM - 4:45 AM UTC)

[18p-D62-1] Fabrication and characterization of free-standing SiO₂ films including Au nanoparticles

〇Maho Kubota¹, Masayoshi Ichimiya², Takahiko Ban², Junichi Yanagisawa² (1.Grad Sch of Univ of Shiga Pref, 2.Univ of Shiga Pref)

Keywords:

Au nanoparticle,ion implantation,SiO2 thin film

Au-Si ion irradiation and heat treatment in air were performed on Si substrates with thermal oxide film. After that, Si was etched from the backside of the sample, and the SiO₂ thin film including Au nanoparticles was attempted to be free-standing. Furthermore, reflectance spectral measurements showed that there was no etching effect on the ion-irradiated surface. On the other hand, in the transmission spectrum after etching, the dip position of the spectrum showing the surface plasmon absorption by the Au nanoparticles changed, indicating that the SiO₂ film was affected by the etching process.