[18p-P08-1~18] 12.4 Organic light-emitting devices and organic transistors

[18p-P08-16] Fabrication of Microelectronics Circuits with Electrophotographic Printing

〇Hinata Oshida¹, Kaito Kozuki¹, Chen Yi Ngu¹, Raiki Hanazaki¹, Masaaki Matsuoka¹, Kang Uk Lee¹, Masatoshi Sakai¹ (1.Chiba Univ.)

Keywords:

printed electronics,semiconductor,integrated circuit

We report on the fabrication of microelectronic circuits by electrophotographic printed electronics. Interdigital S/D electrodes with a line width of 10 µm were patterned with Ag/Ni nano-toners. The elemental composition of the fabricated patterns was 94.1% Ag, and the volume resistivity was 0.515 µΩ・m. Moreover, the NOT circuit structure was fabricated by depositing and stacking an Ag electrode, a C8-BTBT semiconductor layer, and a TMR-P10 insulator layer.