[19p-A23-1~5] Advancements in Junction Technologies and Cutting-Edge Si-LSIs: Past, Present, and Future

3:10 PM - 3:50 PM JST(6:10 AM - 6:50 AM UTC)

[19p-A23-3] Panel Discussion

〇Bunji Mizuno¹, Hiroshi Iwai², Hitoshi Wakabayashi³, Ichiro Mizushima⁴, Masayasu Tanjo⁵, John Ogawa Borland⁶, Osamu Nakatsuka^7,8, Kazuyoshi Takayama⁹ (1.UJTLab, 2.NYCU, 3.IIR, Tokyo Tech, 4.NuFlare Technology, 5.Retired Nissin Ion, 6.J.O.B. Technologies, 7.Grad. Sch. Eng., Nagoya Univ., 8.IMaSS, Nagoya Univ., 9.kind of happy)

Keywords:

Junction Technologies