Presentation Information
[19p-B2-14]Fine line writing by femtosecond laser photothermal reduction deposition inhibited by polyvinylpyrrolidone-added nickel glyoxylic acid complexes
〇(M2)Minori Takahashi1, Phuong Nam Ha1, Tomoji Ohishi2, Mizue Mizoshiri1 (1.Nagaoka Univ. of Tech., 2.Shibaura Inst. of Tech.)
Keywords:
Femtosecond laser direct writing,Ni precipitation,Capping effect
Recently, femtosecond laser direct writing has attracted attention as a metal microfabrication technique that does not require a vacuum. We have been working on femtosecond laser pulse-induced photothermal reduction writing using glyoxylic acid (GA) metal complex ink. However, the excess growth of metals decreased the patterning resolution. In this study, we investigated the effect of adding polyvinylpyrrolidone (PVP) as a capping agent to obtain finer Ni patterns. PVP-added ink was prepared by adding 2 mol% PVP to conventional ink. A green femtosecond laser was focused on the ink film to draw a pattern. The minimum line width of the drawn pattern was 1.7 μm for the ink containing PVP and 4.9 μm for the ink without PVP. TEM images of the cross-sectional patterns showed that the patterns of the ink without PVP had grain boundaries of 10-15 nm or more, whereas those of the ink with PVP had the number of particles with the size in the 5-10 nm range. This result suggests that the added PVP acts as a capping agent, minimizing the pattern width.
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