[19p-D63-1~7] 9.3 Nanoelectronics

1:00 PM - 1:30 PM JST(4:00 AM - 4:30 AM UTC)

[19p-D63-1] [INVITED] Nanoscale Device Fabrication using Electron-beam Lithography (EBL) and Electroless Au Plating (ELGP) and Development of Applications

〇Yutaka Majima¹ (1.Tokyo Tech, IIR)

Keywords:

nanoscale electronic device,electron-beam lithography (EBL),electroless Au plating (ELGP)

I introduce nanoscale device fabrication using electron beam lithography (EBL) and electroless gold plating (ELGP). I also demonstrate the device applications by utilizing internal stresses and strong electric fields at the nanoscale, such as single-molecule transistors using a single π-conjugated molecule as a semiconductor, ELGP nanopore DNA sequencers, nanogap gas sensors, in-plane polarized ferroelectric field effect transistor memory using two-dimensional ferroelectric semiconductors, and nanostructure-induced L1₀-ordered CoPt ferromagnetic nanowires.