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[20a-A32-9]Optimization of film thickness for back-illuminated photocathode of nano-thick Au film

〇Ryota Oshio1, Kantaro Funakoshi1, Akimitu Hatta1, Sukma Wahyu Fitriani2 (1.Kochi Univ. Technol, 2.Kyusyu Univ)
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Keywords:

Nano-Thickness Gold Thin Film,excimer lamp,vacuum

In this study, the photoelectron emission current is measured in high vacuum to determine the film thickness at which the emission current is maximum.
A gold film is deposited by DC magnetron sputtering on a quartz glass of 4 cm x 3 cm in length and width and 2 mm in thickness. A 20 mm diameter area in the center is used as a nano-thickness photoelectric cathode by varying the deposition time from 10 to 25 seconds, and a power-feeding electrode is formed in the peripheral area with a deposition time of 5 minutes. A 172 nm excimer lamp was irradiated from the backside of the photoelectric cathode, voltage was applied to the photoelectric cathode, and voltage current was measured between the photoelectric cathode and a grounded anode about 1 cm away on the vacuum side. From these results, the relationship between film thickness, absorbance and transmittance, and photoelectron emission current is discussed.
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