Presentation Information
[20p-A21-3]Reduction of cumulative error in self-regression model for grinder sim.
〇Keichi Osada1, Teruyuki Katsuoka1, Riku Tanaka1, Fumiya Kawate1, Shota Seki1, Sepasy Saeed2, Yoshifumi Watanabe2 (1.Aixtal, 2.Mipox Corporation)
Keywords:
semiconductor,machine learning,process informatics
The manufacturing process includes a process in which the shape of a sample is sequentially changed through multiple processing steps. At this time, the final shape can be calculated by repeatedly making predictions using the same machine learning model that has been trained with the same input and output formats at each step, but the problem is that errors accumulate due to repeated predictions. In this report, we report the results of a study of a U-Net-based autoregressive model that reduces accumulated errors using the grinding process of semiconductor substrates as an example.
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