Presentation Information
[25a-P01-6]L10-FePd epitaxial films with flat surface grown by r.f. magnetron sputtering for integration of 2D materials
〇(M2)Samuel Vergara1,2, T. V. A Nguyen1,3, H. Naganuma1,3,4,5 (1.CIES Tohoku Univ., 2.ENS Paris-Saclay, 3.CSIS Tohoku Univ., 4.NAIAS, 5.IMaSS Nagoya Univ.)
Keywords:
FePd,Epitaxial growth,2D material
In this study, we investigated the L10-ordering of FePd films using
two heating methods to prepare a high degree of L10-ordering as well as a flat surface. The
heat treatment was carried out by (1) substrate heating during deposition and (2) post-
annealing. The FePd films were deposited by using R.F. magnetron sputtering on the SrTiO3
(100) substrates. In the case of post-annealing, the preferential orientation
was lept at (111) even when the temperature increased to 600°C. (111) diffraction peak position moved with the heat treatment temperature, suggesting that L10-ordering may be promoted. The surface roughness (Ra) is above 5 nm. On the other hand, in the case of substrate heating during deposition, L10-FePd films with heating showed 001 epitaxial growth.L10-ordering of FePd was promoted by increasing the substrate temperatures, and S=0.75, which does not take into account the influence of composition ratio, was obtained relatively low temperature of 300°C. R a could be decreaed below 0.4 nm by substrate heating during deposition. The substrate heating during deposition has advantages against post-annealing for both L10-ordering and flatness. The damping constant for as-deposited fcc-FePd showed 0.0027. We will discuss the magnetic damping constant with heat treatment of L10-FePd films.
two heating methods to prepare a high degree of L10-ordering as well as a flat surface. The
heat treatment was carried out by (1) substrate heating during deposition and (2) post-
annealing. The FePd films were deposited by using R.F. magnetron sputtering on the SrTiO3
(100) substrates. In the case of post-annealing, the preferential orientation
was lept at (111) even when the temperature increased to 600°C. (111) diffraction peak position moved with the heat treatment temperature, suggesting that L10-ordering may be promoted. The surface roughness (Ra) is above 5 nm. On the other hand, in the case of substrate heating during deposition, L10-FePd films with heating showed 001 epitaxial growth.L10-ordering of FePd was promoted by increasing the substrate temperatures, and S=0.75, which does not take into account the influence of composition ratio, was obtained relatively low temperature of 300°C. R a could be decreaed below 0.4 nm by substrate heating during deposition. The substrate heating during deposition has advantages against post-annealing for both L10-ordering and flatness. The damping constant for as-deposited fcc-FePd showed 0.0027. We will discuss the magnetic damping constant with heat treatment of L10-FePd films.