Presentation Information

1:45 PM - 2:00 PM JST(4:45 AM - 5:00 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation AwardEnglish Presentation

[25p-12M-4]Characterization of a pulsed, high-pressure hydrogen gas source for H radical-based cleaning of extreme ultraviolet lithography mirrors

〇(P)James Edward Hernandez¹, Nozomi Tanaka¹, Yubo Wang¹, Katsunobu Nishihara^1,2, Kyung Sik Kang³, Shinji Ueyama⁴, Shinsuke Fujioka¹ (1.ILE, Osaka Univ., 2.Osaka Metro. Univ., 3.Samsung MR, 4.Samsung DSRJ)

Keywords:

extreme ultraviolet lithography,laser produced plasma,hydrogen radicals

This study aims to investigate the use of a pulsed, high pressure injection system in the production of hydrogen radicals for decontamination of tin-coated mirrors in extreme ultraviolet (EUV) light scanner systems. A high density gas system consisting of a valve and nozzle is being developed to produce a localized gas, where EUV light will be incident on, to generate hydrogen radicals.

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