[10a-N403-1~10] 7.1 X-ray technologies

9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[10a-N403-3] High EUV spectral purity by oblique laser incidence

〇Hayato Yazawa¹, Shunya Yamamoto¹, Shintaro Hayasaka¹, Tsukasa Sugiura¹, Tatsuya Soramoto¹, Kaito Nishimiya², Eiji Takahashi², Shinichi Namba³, Takeshi Higashiguchi¹ (1.Utsunomiya Univ., 2.Riken RAP, 3.Hiroshima Univ.)

Keywords:

EUV,laser produced plasma,oblique laser incidence