Presentation Information
[8a-P05-20]Temperature Dependence of Cu3N Growth using EDA by Mist CVD
〇(M2)Chisato Tsukioka1, Kazuyo Omura2, Issei Narita2, Hiroki Nagai1, Takeyoshi Onuma1, Tohru Honda1, Tomohiro Yamaguchi1 (1.Kogakuin Univ., 2.Tohoku Univ. IMR)
Keywords:
Cu3N,Mist Chemical Vapor Deposition
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