Presentation Information

[8a-P05-20]Temperature Dependence of Cu3N Growth using EDA by Mist CVD

〇(M2)Chisato Tsukioka1, Kazuyo Omura2, Issei Narita2, Hiroki Nagai1, Takeyoshi Onuma1, Tohru Honda1, Tomohiro Yamaguchi1 (1.Kogakuin Univ., 2.Tohoku Univ. IMR)

Keywords:

Cu3N,Mist Chemical Vapor Deposition