Presentation Information
[9a-P02-14]Influence of fluoride thin film/oxide substrate interface on ultraviolet photoconductivity
〇Kota Hibino1, Yuki Maruyama1, Gakuto Ozawa1, Toru Asaka1, Shizuka Seto1, Takashi Matsubara1, Ayako Iwasaka1, Yoko Sakurai1, Kohei Yamanoi2, Michal Kohout3, Marilou Raduban2,4, Jiri Olejnicek3, Shingo Ono1 (1.Nagoya Institute of Technology, 2.Institute of Laser Engineering, Osaka Univ., 3.Czech Academy of Sciences, 4.Massey Univ.)
Keywords:
Fluoride Thin Film,Interface,Photodetectors
With the growing demand for high-energy ultraviolet (UV) light used in semiconductor cleaning and surface modification, there is an increasing need for durable UV detectors capable of stable, long-term monitoring. We have focused on fluoride materials and have been developing photoconductive UV sensors. In this study, we aimed not only to further improve sensor performance but also to investigate the interfacial behavior between fluoride thin films and oxide substrates, which plays a crucial role in the development of heterojunction devices.