Presentation Information
[10a-B32-6]Damage-suppression effect of cryo-FIB processing for cross-sectional TEM specimens of organic light-emitting diodes
〇(PC)Yusei Sasaki1, Kazuo Yamamoto1, Shunsuke Kozaka2, Yuka Yasuda2, Satoshi Anada1, Noriyuki Yoshimoto3, Hironori Kaji2 (1.Japan Fine Ceramics Center, 2.Institute for Chemical Research, Kyoto Univ., 3.Faculty of Science and Engineering, Iwate Univ.)
Keywords:
organic light-emitting diode,transmission electron microscopy,focused ion beam
Using electron holography, a technique of transmission electron microscopy, we evaluated the effect of focused ion beam (FIB) processing temperature on the structure and internal potential distribution of cross-sectional organic light-emitting diode specimens. Room-temperature processing caused a marked increase in organic-layer thickness and blurred the interlayer potential differences, whereas cryo-FIB processing preserved both the structure and potential distribution. Comparison of material-dependent behavior further suggested a relationship between the glass transition temperature of the constituent materials and their resistance to FIB-induced damage.