[10a-C310-1~14] CS.9 Code-sharing session of 6.3&6.4

11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)

[10a-C310-8] In-situ thermal treatment of oxide substrates using a mid-infrared CO₂ laser

〇Takahiro Fujita^1,2, Yota Nakajima², Yoshio Kaneko¹, Yoshinori Tokura^1,2,3, Masashi Kawasaki^1,2 (1.RIKEN CEMS, 2.Univ. of Tokyo, 3.Tokyo College)

Keywords:

oxide thin films,surface treatment

The properties of oxide thin films and heterointerfaces strongly depend on the crystalline quality of the substrate surface. Recently, we introduced a house-made substrate-heating system using a mid-infrared CO₂ laser. By annealing sapphire and Eu₂Ti₂O₇ single-crystal substrates at temperatures above 1000°C, we confirmed the formation of well-defined step-and-terrace structures solely through in-situ thermal treatment. This method overcomes the limitations of conventional ex-situ processes and is expected to be applicable to a wide range of complex oxides.