Presentation Information
[10p-A31-10]Single Step Deposition of YBa2Cu3O7 Thin Films by Mist CVD Method
〇(M1)Naoya Shibata1, Ryo Horiuchi1, Akiyoshi Matsumoto2, Yusuke Sogabe1, Masayoshi Inoue3, Ryo Teranishi4, Takumi Ikenoue1 (1.Kyoto Univ., 2.NIMS, 3.FIT, 4.Kyusyu Univ.)
Keywords:
YBCO,Mist CVD,REBCO
YBa2Cu3O7 (YBCO), with its high critical temperature of 92 K, shows great promise for superconducting wire applications. However, establishing a low-cost, high-productivity fabrication process under atmospheric pressure remains a critical challenge. In this study, we employed the mist chemical vapor deposition (Mist CVD) method and attempted single-step deposition of YBCO thin films by supplying oxygen during the deposition process to promote the thermal decomposition of carbon-containing precursor species. X-ray diffraction (XRD) analysis of the deposited films revealed diffraction peaks corresponding to the YBCO (00l), together with peaks attributed to YBCO (103), BaCO3 and Y2O3. Although secondary phases were observed, the results indicated feasibility of single-step deposition of YBCO thin film.
