Presentation Information
[11a-E203-7]Epitaxial Growth of Si, Ge, or Sc Doped AlN Films Using Single-Crystal Ti Electrodes / Multi-unctional® Interlayers and Their BAW Characterization
〇(M1)Hideaki Gommori1, Masashi Suzuki1, Shoji Kakio1, Masashi Seki2, Takeshi Kijima2 (1.Univ. of Yamanashi, 2.Gaianixx Inc.)
Keywords:
AlN film,epitaxial growth,bulk acoustic wave
