[11p-A31-1~9] 6.2 Carbon-based thin films

3:30 PM - 3:45 PM JST(6:30 AM - 6:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[11p-A31-6] Applying Shield Method in High-Rate Filtered Arc Deposition System for Preparing DLC Film

〇Haru Sano¹, Genki Sano¹, Hirofumi Takikawa¹, Takahiro Hattori², Hiroki Gima² (1.Toyohashi Univ. Technol., 2.OSG Corp.)

Keywords:

tetrahedral amorphous carbon,High-Rate Filtered Arc Deposition System,vacuum arc deposition

In this study, the shield method was applied to further reduce droplet deposition onto tetrahedral amorphous carbon (ta-C) films during high-rate deposition using a vacuum arc deposition system (HR-FAD). Deposition experiments were conducted with a 20-mm-wide shield plate. The results demonstrated that the number of droplets was drastically reduced at the center of the plasma outlet. Conversely, no significant difference was observed between the films prepared with and without the shield plate at positions outside the shield zone.