Presentation Information

[11p-N302-2]Fundamental Investigation of a Multi-Ion Image Sensor Based on Microcavity Structures

〇(M1)Tatsuki Ueno1, Hideo Doi1, Rikuto Ueda1, Yong-Joon Choi1, Kazuhiro Takahashi1, Toshihiko Noda1, Kazuaki Sawada1 (1.Toyohashi Univ.)

Keywords:

Multi-Ion Imaging,CMOS Sensor,Photoresist Structures

To visualize extracellular ion dynamics, we developed a CMOS potential-detecting array sensor. Standard photolithography cannot pattern plasticized PVC membranes due to their low resistance to organic solvents and UV light, limiting conventional devices to single-ion detection.To achieve multi-ion imaging, this study proposes a micro-patterning process using electrostatic inkjet technology. Microcavities (30–50 µm square) were fabricated using a 10-µm-thick SU-8 photoresist template, into which PVC solutions containing potassium (K+) and calcium (Ca2+) ionophores were selectively dispensed with picoliter-level precision.The fabricated sensor demonstrated practical potential responses of ~25 mV/dec for K+ and ~20 mV/dec for Ca2+, while the unfunctionalized regions exhibited a pH response of 60 mV/pH. These results validate this localized dispensing process for high-density, multi-ion chemical imaging.