[8a-A13-1~13] 6.3 Oxide electronics

11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)

[8a-A13-9] Low temperature deposition of crystalline-SnO₂ thin film using high-power impulse magnetron sputtering

〇Takayuki Ohta¹, Yuta Saito¹, Kosuke Takenaka², Yuichi Setsuhara² (1.Meijo Univ., 2.Osaka Univ.)

Keywords:

sputtering,Oxide semiconductor