[8a-B11-1~13] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[8a-B11-4] Effect of Gas Pressure on Cathode Spot Behavior in a High-Rate Filtered Arc Deposition System for TiN Film Preparation

〇Shogo Ochi¹, Hirofumi Takikawa¹, Takahiro Hattori², Hiroki Gima² (1.Toyohashi Univ. Technol., 2.OSG Corp.)

Keywords:

TiN,vacuum arc deposition,steered arc method

The effect of nitrogen atmosphere conditions on cathode spot behavior in a high-rate filtered arc deposition (HR-FAD) system for TiN film deposition was investigated. Using a Ti cathode, the cathode spot motion speed was measured while varying the nitrogen gas flow rate and pressure. The results showed that the cathode spot motion speed tended to decrease with increasing pressure, indicating that nitrogen atmosphere conditions influence cathode spot behavior.