[8a-B11-1~13] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

10:15 AM - 10:30 AM JST(1:15 AM - 1:30 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[8a-B11-6] Characterization of the Mechanisms of Membrane Fabrication by Solid-Gas Mixed-Phase Jet

〇Ryota Kuroda¹ (1.Kyocera Co.)

Keywords:

Film deposition technology,PVD,Microcrystalline film

We present our recent findings on the supersonic free-jet PVD (SFJ-PVD) method. This technology is a novel film deposition process that utilizes a gas–solid multiphase jet and offers advantages such as room-temperature deposition, controllable film density, and high directionality. Through our research to date, we have investigated the effects of various factors, including particle velocity, particle shape, and material properties, on film structure and have obtained insights into the mechanisms of film densification. In this presentation, we focus specifically on the film densification mechanism and discuss in detail the factors governing film densification, with particular emphasis on the relationship between the diffusion coefficient of the material and the particle surface morphology and film density.