[8a-B11-1~13] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[8a-B11-7] Comparison between Photocatalytic Activities of ZnO Nanoparticles Treated by Atmospheric-Pressure Low-Temperature Air and O₂ Plasma-Assisted Annealing

〇(M2)Naoya Takagi¹, Kawakami Retsuo¹, Yanagiya Shin-ichiro^1,2, Nakano Yoshitaka³, Niibe Masahito⁴ (1.Tokushima Univ., 2.pLED, Tokushima Univ., 3.Chubu Univ., 4.The Univ. of Tokyo)

Keywords:

plasma-assisted annealing,ZnO nanoparticles,photocatalytic activities

ZnO exhibits high photocatalytic activity under UV irradiation due to its high electron mobility and efficient charge separation, as well as inherent antibacterial properties. However, its wide bandgap of approximately 3.2 eV limits light absorption in the visible region, resulting in low photocatalytic activity under visible light. Previous studies have shown that plasma-assisted annealing (PAA) using atmospheric-pressure low-temperature air plasma enhances the visible-light photocatalytic activity of ZnO nanoparticles. Nevertheless, it remains unclear whether oxygen-based PAA provides similar improvements. This study compares the photocatalytic performance of ZnO nanoparticles treated with atmospheric-pressure low-temperature oxygen PAA and air PAA, and clarifies the differences in their effects. The discharge gap and applied voltage of the dielectric barrier discharge system were adjusted for each gas to reflect their distinct physical properties.