[8a-N302-1~11] 18.1 Materials Informatics

11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)

[8a-N302-8] Physics-Based Intermediate Feature Generation for Plasma Process Prediction Based on Plasma and Material Information Science

〇KUNIHIRO KAMATAKI¹, Sukma Fitriani², Kazuki Nagamine^1,2, Yosei Kurosaki¹, Tsukasa Masamoto^1,2, Daisuke Yamashita¹, Takamasa Okumura¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1.Kyushu Univ. ISEE., 2.Kyushu Univ. IMI.)

Keywords:

Semiconductor plasma processes,Process informatics,Physics-based feature engineering