Presentation Information
[8a-PA2-18]Fabrication of Cs3Bi2Br9 Thin Films by the Mist Deposition Method
〇(M2)Daito Yoshihara1, Takumi Ikenoue1, Toshiya Doi1 (1.Kyoto Univ.)
Keywords:
Cs3Bi2Br9,mist deposition method
Cs3Bi2Br9 has attracted attention as a next-generation lead-free X-ray detection material, owing to its excellent X-ray absorption derived from the high atomic number of Bi, as well as its high resistivity and low dark current characteristics. In this study, Cs3Bi2Br9 films were fabricated by mist deposition, a process well-suited for low-cost and large-area film formation. Deposition conditions including substrate temperature and carrier gas flow rate were systematically optimized. As a result, flat Cs3Bi2Br9 films were obtained in which crystal grains of approximately 2 µm diameter grew densely in a columnar manner, with uniaxial orientation along the (00l) direction.