[8a-PA2-1~24] 2 Ionizing Radiation (Poster)

[8a-PA2-21] Fabrication ob Cs₃Cu₂I₅ Films by the Mist Deposition

〇(M2)Reo Komai¹, Takumi Ikenoue¹, Toshiya Doi¹ (1.Kyoto University.)

Keywords:

Cs3Cu2I5,scintillator,mist deposition method

Cs₃Cu₂I₅ is expected to be applied as an X-ray inspection devices because of its high quantum yield and stability. In this study, oriented Cs₃Cu₂I₅ films were fabricated by mist deposition. Films were prepared by varying the solution concentration, substrate temperature, and carrier gas flow rate, and were evaluated by XRD and SEM. As a result, a flat Cs₃Cu₂I₅ film was obtained under the conditions of 5 mM, 160°C, and 0.5 L/min, in which the film was uniaxially oriented along the (001) direction and densely grown with crystal grains of approximately 2 μm.