[8p-B11-1~16] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:45 PM - 5:00 PM JST(7:45 AM - 8:00 AM UTC)

[8p-B11-11] Electronic properties and dissociation channels of CHF₂CHFCHF₂ molecule

〇Toshio Hayashi¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ.)

Keywords:

CHF2CHFCHF2,Etching gas,Primarily dissociation process

Primarily Dissociation routes are discussed by using computational chemistry. Briefly summarized, CHF₂ ion is predominantly produced around at the vertical ionization region (12.3 eV) and the counterpart (CHFCHF₂⁺) ion is produced in the slightly higher energy region at 13.2 eV. In the excitation process, CHF₂CHFCHF₂ predominantly dissociates to C₃H₃F₄ + F at the C-F bonds. In the electron attachment process, F^-+CHF₂CHCHF₂ is produced by the vertical electron attachment to 3P Rydberg state at approximately 2.8-3.8 eV.