Presentation Information

Symposium (Oral)Symposium : Strategic Fab Operations: A New Foundation for Next-Generation Device Realization

[8p-E310-1~7]Strategic Fab Operations: A New Foundation for Next-Generation Device Realization

Tue. Sep 8, 2026 1:30 PM - 5:45 PM JST
Tue. Sep 8, 2026 4:30 AM - 8:45 AM UTC

E310 (First Year Education Bld. E Block)

Chair : Shin Nakagawa(SCREEN), Toshiyuki Mitsue(Deloitte)

Advancing next-generation semiconductors requires research designed around not only materials and device innovation but also the volume-Fab operation technologies that support them. This symposium explores advanced chips that become manufacturable only when a volume Fab can precisely manage process sequence, tool-dispatch timing, inter-process queue time, and automated transport—discussing them through the lenses of advanced Fab operation, 3D integration, design-manufacturing co-optimization, and environmental-impact reduction, and reframing the manufacturing floor's time and process constraints as a new starting point for semiconductor research.

2:40 PM - 3:20 PM JST(5:40 AM - 6:20 AM UTC)

[8p-E310-3]Measurement Technologies for Reducing Environmental Impact and Contributing to the Green Transformation of the Semiconductor Industry

〇Masaya Yoshioka¹, Nobuyuki Kannan² (1.HORIBA, 2.HORIBA STEC)

Keywords:

DRE measurement,GHG

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