[9a-C310-1~13] 6.4 Thin films and New materials

11:45 AM - 12:00 PM JST(2:45 AM - 3:00 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[9a-C310-11] Evaluation of hydrogen barrier films using optical properties of WO₃ thin films (3): Effects of film properties on hydrogen permeability

〇Taiga Kurihara¹, Minseok Kim¹, Yuki Oguchi², Toshihiro Okajima³, Yuzo Shigesato¹ (1.Aogaku Univ., 2.Aogaku Univ. Analysis Cent., 3.Aichi SR)

Keywords:

Gas barrier,Hydrogen science and technology,Chromic material

Hydrogen adoption faces critical challenges such as leakage risks and embrittlement, thereby necessitating effective gas barrier films and quantitative evaluation methods. This study utilized the gasochromic properties of a Pd-capped amorphous tungsten trioxide (a-WO₃) thin film to evaluate various inorganic coatings (SiO₂, SiN_X, Al₂O₃). Samples were exposed to a H₂ mixture, and optical density changes of the a-WO₃ layer were monitored to determine hydrogen permeability. Sputtering parameters significantly affected performance; specifically, total deposition pressure controlled film density, directly dictating permeability. For SiO₂ films, a low permeability of 10^-17 mol/(Pa·m·s) was achieved below 1 Pa, whereas it degraded to 10^-15 mol/(Pa·m·s) beyond 1.5 Pa. A similar pressure-dependent shift occurred for SiN_X films. Optimizing both material selection and deposition parameters, particularly total pressure, is crucial for enhancing hydrogen barrier properties.