[9a-E218-1~10] 13.8 Optical properties and light-emitting devices

10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)

[9a-E218-7] Fabrication of colloidal silicon dot via chemical etching assist cracking of porous silicon

〇Shota Sasaki¹, Nobuyoshi Koshida^1,2, Toshihiro Nakamura¹ (1.Hosei Univ., 2.Tokyo Univ. of A&T)

Keywords:

colloidal silicon quantum dots,dispersible