[9a-PA2-1~9] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[9a-PA2-5] Molecular Dynamics Analysis of the Pattern Collapse Suppression of Nanopatterned Structures in Rapid Drying

〇Yudai Shinozaki¹, Yuto Yamamoto¹ (1.Shibaura Mechatronics Corporation)

Keywords:

Molecular dynamics

As semiconductor devices continue to scale down, pattern collapse induced by capillary forces during the drying process after wet cleaning has emerged as a critical issue in high-aspect-ratio nanopatterns. In this presentation, we report the results of molecular dynamics simulation of IPA-filled nanopatterned structures, with a focus on comparing their behavior under normal and rapid drying conditions. The simulation results confirmed that, under normal drying conditions, pattern collapse occurred as a result of liquid-bridge formation. In contrast, under rapid drying conditions, IPA preferentially vaporized near the pattern surface, thereby preventing pattern collapse.