Presentation Information
[9a-PA4-28]Design, Fabrication, and Coupling Efficiency Evaluation of Metalenses
for Optical Communication Bands
〇(D)Masaki Okamoto1, Atsushi Kibune1, Shodai Hasebe2, Yasufumi Yamada2, Takeshi Sugiura3, Shiei Kusajima3, Toru Asahi1,2,4, Kenta Nakagawa2 (1.Waseda Univ., 2.Waseda Univ ., 3.OPTORUN Co., Ltd., 4.Waseda Univ .)
Keywords:
metasurface,metalens,metamaterial
For inter-chip optical connections in next-generation all-photonic networks, metasurfaces were designed and fabricated for operation at telecommunication wavelengths, and their coupling characteristics with optical fibers were evaluated. The metalenses were designed using the finite-difference time-domain (FDTD) method and rigorous coupled-wave analysis (RCWA), and were fabricated by electron-beam lithography and reactive-ion etching of an amorphous silicon (a-Si) film on a quartz substrate. After confirming the fabricated structures by scanning electron microscopy (SEM), the focal length and coupling efficiency were measured. The validity of the design method and the factors affecting coupling efficiency were investigated through comparisons with simulations and among multiple metalenses.