Presentation Information

2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)

[9p-E203-5]Precise Patterning using Electron Beam Lithography on a 3D-Structure

〇(M1)Tetsu Ohinata^1,2, Taro Itatani², Akihiro Noriki², Yoshinobu Okano¹, Takeru Amano² (1.Tokyo City Univ., 2.AIST)

Keywords:

EB writing,optical waveguides,Uniform-Width Lithography

Regarding the issues of variations in effective dose and linewidth when performing electron beam lithography on samples with height differences, by using a simplified method to correct the linewidth design data, we achieved results with almost the same linewidth at different heights, indicating potential for application in optical waveguides.

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