The 87th JSAP Autumn Meeting 2026

This research group was newly established this year to provide a forum for broad discussion on atomic layer processes (ALP), including atomic layer deposition (ALD) and atomic layer etching (ALE). This will be the group’s first technical session.
The morning session will feature nine presentations, including two invited talks from within the research group, covering topics such as ALD of oxide thin films, plasma-enhanced ALD, and atomic layer processes for high-aspect-ratio and three-dimensional structures.

This research group was newly established this year to provide a forum for broad discussion on atomic layer processes (ALP), including atomic layer deposition (ALD) and atomic layer etching (ALE). This will be the group’s first technical session.
The afternoon session will feature seven contributed talks on topics including in-situ measurement techniques for ALD, as well as area-selective ALD (AS-ALD), such as selective deposition using self-assembled monolayers and inhibitors, and bottom-up filling.