[18p-M_103-8~10] 8.6 Plasma Electronics English Session

4:00 PM - 4:15 PM JST(7:00 AM - 7:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation AwardEnglish Presentation

[18p-M_103-8] Effect of High Voltage Application on Metal Wire Covered by Quartz Tube for Microwave-Excited Water Vapor Plasma Generation

〇(M1)Hlaing HninThazin¹, Hiroki Taniguchi¹, Kyaw Swar Thiha¹, Yamato Hiraoka¹, Yusuke Nakano¹, Yasunori Tanaka¹, Tatsuo Ishijima¹ (1.Kanazawa Univ)

Keywords:

microwave-excited,water vapor plasma,spark ignition

This study investigates microwave-excited water vapor plasma asher (WPA) as an environmentally friendly alternative for photoresist ashing in advanced semiconductor processes. Although water vapor plasma can reduce high temperature, metal oxidation, and low ashing rate, plasma ignition at the operating pressure of 6.8 kPa is difficult due to high electron affinity and frequent collisions. To overcome this, a high-voltage spark igniter was introduced to supply primary electrons near the antenna region. Experimental results show that without high voltage, plasma could not be generated, whereas with spark ignition, stable plasma was produced with a short delay time of less than 0.4 s. This demonstrates that high-voltage application effectively triggers and stabilizes microwave-excited water vapor plasma generation.