Presentation Information

[G3-P203-02]Low temperature deposition of indium oxide film by high-power impulse magnetron sputtering

*Daiki Horikawa1, Takayuki Ohta1, Kosuke Takenaka2, Yuichi Setsuhara2 (1. Meijo Univ. (Japan), 2. Osaka Univ. (Japan))

Keywords:

high-power impulse magnetron sputtering,metal oxide semiconductor,indium oxide