Session Details

[G3-P203]Poster 203

Wed. Dec 10, 2025 6:00 PM - 8:00 PM JST
Wed. Dec 10, 2025 9:00 AM - 11:00 AM UTC
Poster(G1+G2)

[G3-P203-01]Fabrication of (Ga1-xInx)2O3 alloy films on a c-plane sapphire substrate by chemical solution deposition and their application to solar-blind ultra-violet photodetectors

*Akito Horibe1, Hiroto Tsuruyama1, Iori Yamasaki1, Shunsuke Enoki1, Nobuya Hiroshiba1, Masatoshi Koyama1, Kazuto Koike1 (1. Osaka Inst. of Tech., NMRC (Japan))

[G3-P203-02]Low temperature deposition of indium oxide film by high-power impulse magnetron sputtering

*Daiki Horikawa1, Takayuki Ohta1, Kosuke Takenaka2, Yuichi Setsuhara2 (1. Meijo Univ. (Japan), 2. Osaka Univ. (Japan))

[G3-P203-03]Low temperature deposition of crystalline Indium Gallium Zinc Oxide film by high-power impulse magnetron sputtering

*Taketo Nagata1, Kosuke Takenaka2, Yuichi Setsuhara2, Takayuki Ohta1 (1. Meijo University (Japan), 2. Osaka University (Japan))

[G3-P203-04]On the Background Pressure of Sputtering Deposition Influencing CO2 Sensitivity of In2O3 TFT Sensor

*Yuichiro Ebisawa1, Yoshikazu Shin1, Kazuho Ishi1, Jin Hyeok Cha2, Tomohiro Yamaguchi1, Shinya Aikawa1 (1. Kogakuin Univ. (Japan), 2. Chonnam National Univ. (Korea))

[G3-P203-06]Characterization of Indium Oxide TFTs Fabricated by Aqueous Solution Processing and Excimer Light Irradiation

*Kauki Ueda1, Toshihiko Maemoto1, Ryosuke Kasahara1, Hideya Ochiai1, Akira Fujimoto1, Hideo Wada1, Masatoshi Koyama1, Akihiko Fujii1, Akihiro Shimizu2, Noritaka Takezoe2, Hiroyasu Ito2 (1. Osaka Institute of Tech. (Japan), 2. Ushio Inc. (Japan))

[G3-P203-07]Stability of epitaxial oxide thin film growth on silicon substrate withevaluation using density functional theory

*Satoru Kaneko1,2, Takashi Tokumasu3, Masahito Kurouchi1, Manabu Yasui1, Masahiko Mitsuhashi1, Can Mutlu Musa4, Ruei Sung Yu5, Sumanta Kumar Sahoo6, Mariana Ionita7, Meškinis Šarūnas8, Masahiro Yoshimura1,2, Akifumi Matsuda2 (1. KISTEC (Japan), 2. Tokyo Inst. of Science (Japan), 3. Tohoku Univ. (Japan), 4. Istanbul Univ. (Japan), 5. National Chin-Yi Univ. of Tech. (Japan), 6. Radhakrishna Inst. of Tech. and Eng. (Japan), 7. Univ. of Sci. and Tech. Politehnica of Bucharest (Japan), 8. Kaunas Univ. of Tech. (Japan))

[G3-P203-08]Application to Functional Oxide Thin Films via Negative Atomic Oxygen Ion Irradiation Generated by Direct Current Arc Plasma

*Hisashi Kitami1, Makoto Maehara1, Tetsuya Yamamoto2 (1. Sumitomo Heavy Industries, Ltd. (Japan), 2. Kochi Univ. of Tech. (Japan))

[G3-P203-09]Plasma Cleaning Studies of Optical Mirrors Affected by Carbon Contamination During High Power Laser Irradiations

*Valentin Craciun Craciun1,2, V Satulu1, C Constantin1, A Bonciu1, V Ion1, D Craciun1, P. Garoi1, G. Bleotu2, S. A. Irimiciuc1, F. Al-Abedj2, E Matache2, S Das2, D Sandu2, D Cracana2,1, T Jitsuno2, D Ursescu2, Gheorghe Dinescu1 (1. INFLPR (Romania), 2. ELI-NP and IFIN-HH (Romania))

[G3-P203-10]Current status of ARPES beamline BL06U at NanoTerasu

*Koji Horiba1, Miho Kitamura1, Fumi Nishino1, Hideaki Iwasawa1, Nobuhito Inami1, Yoshiyuki Ohtsubo1, Jun Miyawaki1, Kohei Yamamoto1, Takeshi Nakatani1, Kento Inaba1, Akane Agui1, Takeshi Imazono1, Kentaro Fujii1, Tomoyuki Takeuchi1, HIroaki Kimura1 (1. National Institutes for Quantum Science and Technology (Japan))

[G3-P203-13]Characterization of MIM Diodes Fabricated Using ZnO for Rectenna Applications

*Haruto Monda1, Kensuke Nakata1, Naoki Takada1, Hideo Wada1, Masatoshi Koyama1, Akihiko Fujii1, Toshihiko Maemoto1 (1. Osaka Institute of Tech. (Japan))

[G3-P203-14]Low-Temperature Processed AlOx/ZnO Multilayer Oxide TFTs for OLED Pixel Driving Applications

*Naoki Takada1, Kensuke Nakata1, Kaiko Yuge1, Akira Fujimoto1, Hideo Wada1, Masatoshi Koyama1, Akihiko Fujii1, Toshihiko Maemoto1 (1. Osaka Institute of Tech. (Japan))

[G3-P203-15]Atmospheric-Pressure Chemical Vapor deposition of ZnGa2O4 Films and Nanowires using Zn, Ga and H2O as Source Materials

*Tomoaki Terasako1, Ryohei Ando1, Rio Horiuchi1, Arata Sugawara1, Masakazu Yagi2 (1. Ehime Univ. (Japan), 2. Natl. Inst. Tech., Kagawa Coll. (Japan))

[G3-P203-16]Electric and Magnetic Properties of LaFeO3/CaFeOx Heterostructures Grown on SrTiO3(001) Substrates Using Pulsed Laser Deposition Method

*Daido Yoshihara1, Takumi Nagayama1, Yusuke Hiratsuka1, Nobuyuki Iwata1 (1. Nihon Univ. (Japan))

[G3-P203-17]Pulse Operation Properties of PEDOT:PSS/ZnO Nanorods/GZO Heterostructures

*Tomoaki Terasako1, Sayaka Ikeda2, Masakazu Yagi3, Tetsuya Yamamoto4 (1. Graduate School of Science and Engineering, Ehime University (Japan), 2. Faculty of Engineering, Ehime University (Japan), 3. National Institute of Technology, Kagawa College (Japan), 4. Research Institute, Kochi University of Technology (Japan))

[G3-P203-18]A Study of Switching Mechanism in ITO/SiOx/ITO ReRAM Based on Electrode Surface Observation

*Yuito Makishima1, Kento Moriya1, Yugo Yamaguchi1, Tomohiro Yamaguchi1, Shinya Aikawa1 (1. Kogakuin Univ. (Japan))

[G3-P203-19]Correlation Between Oxygen-Derived Defects and Hysteresis Window in p-Type TeOX TFT

*Kazuho Ishi1, Yoshikazu Shin1, Shinya Aikawa1 (1. Kogakuin Univ. (Japan))

[G3-P203-20]Effect of Crystallinity on Resistive Switching Behavior of Cu(II)-Containing PVA as the Resistance Change Layer

*Yuji Iwasawa1, Yuito Makishima1, Koga Nakamura1, Ryota Kobayashi, Hiroki Nagai1, Shinya Aikawa1 (1. Kogakuin University (Japan))

[G3-P203-21]Mechanistic Insight into Anodic Electrochemical Formation of 2D Conductive Metal–Organic Frameworks

*Sarin Sajjadu Krishna1 (1. National Tsing Hua University (Taiwan))

[G3-P203-22]Tungsten oxide coated TiO2 photocatalyst synthesized by photoelectrochemical deposition

*Koji Abe1, Eko Kubota1 (1. Nagoya Institute of Technology (Japan))

[G3-P203-23]Polarization-Dependent Nonlinear Optical Behavior in TmIG/Pt Thin Films

*SHI XUAN XU1, Hsiu An Liu1, Hua Shu Hsu1, Tzu Fang Hsu1 (1. National Pingtung Univ. (Taiwan))