Presentation Information

[G3-P203-03]Low temperature deposition of crystalline Indium Gallium Zinc Oxide film by high-power impulse magnetron sputtering

*Taketo Nagata1, Kosuke Takenaka2, Yuichi Setsuhara2, Takayuki Ohta1 (1. Meijo University (Japan), 2. Osaka University (Japan))

Keywords:

high-power impulse magnetron sputtering,metal oxide semiconductor,IGZO