Presentation Information
[G3-P203-03]Low temperature deposition of crystalline Indium Gallium Zinc Oxide film by high-power impulse magnetron sputtering
*Taketo Nagata1, Kosuke Takenaka2, Yuichi Setsuhara2, Takayuki Ohta1 (1. Meijo University (Japan), 2. Osaka University (Japan))
Keywords:
high-power impulse magnetron sputtering,metal oxide semiconductor,IGZO
