Presentation Information
[G3-P203-06]Characterization of Indium Oxide TFTs Fabricated by Aqueous Solution Processing and Excimer Light Irradiation
*Kauki Ueda1, Toshihiko Maemoto1, Ryosuke Kasahara1, Hideya Ochiai1, Akira Fujimoto1, Hideo Wada1, Masatoshi Koyama1, Akihiko Fujii1, Akihiro Shimizu2, Noritaka Takezoe2, Hiroyasu Ito2 (1. Osaka Institute of Tech. (Japan), 2. Ushio Inc. (Japan))
Keywords:
Oxide semiconductors,Indium oxide,Thin-film transistors,Solution processing,Deep ultraviolet irradiation