[G3-P203] Poster 203

[G3-P203-07] Stability of epitaxial oxide thin film growth on silicon substrate withevaluation using density functional theory

*Satoru Kaneko^1,2, Takashi Tokumasu³, Masahito Kurouchi¹, Manabu Yasui¹, Masahiko Mitsuhashi¹, Can Mutlu Musa⁴, Ruei Sung Yu⁵, Sumanta Kumar Sahoo⁶, Mariana Ionita⁷, Meškinis Šarūnas⁸, Masahiro Yoshimura^1,2, Akifumi Matsuda² (1. KISTEC (Japan), 2. Tokyo Inst. of Science (Japan), 3. Tohoku Univ. (Japan), 4. Istanbul Univ. (Japan), 5. National Chin-Yi Univ. of Tech. (Japan), 6. Radhakrishna Inst. of Tech. and Eng. (Japan), 7. Univ. of Sci. and Tech. Politehnica of Bucharest (Japan), 8. Kaunas Univ. of Tech. (Japan))

Keywords:

oxide,epitaxial growth,silicon,DFT