Presentation Information
[G3-P203-08]Application to Functional Oxide Thin Films via Negative Atomic Oxygen Ion Irradiation Generated by Direct Current Arc Plasma
*Hisashi Kitami1, Makoto Maehara1, Tetsuya Yamamoto2 (1. Sumitomo Heavy Industries, Ltd. (Japan), 2. Kochi Univ. of Tech. (Japan))
Keywords:
Negative atomic oxygen ion,Oxygen vacancy,Indium oxide,Silicon oxide