[G4-O301] Oral 301

11:00 AM - 11:30 AM JST(2:00 AM - 2:30 AM UTC)

[G4-O301-03] Novel Low-Temperature Deposition of Diverse Sulfides via Sulfur Plasma

*Issei Suzuki¹ (1. Tohoku Univ. (Japan))

Keywords:

Sulfide semiconductors,thin film,sputtering,plasma,low-temperature deposition