[G4-P102] Poster 102

[G4-P102-02] Carrier generation in p-type NiO films deposited by RF magnetron sputtering using a NiO target

*Mana Shibata¹, Minseok Kim¹, Isoa Tamai², Yusuke Maeyama², Yuki Oguchi¹, Junjun Jia³, Yuzo Shigesato¹ (1. Aoyama Gakuin Univ. (Japan), 2. Shindengen Electric Manufacturing Corp., Ltd. (Japan), 3. Waseda Univ. (Japan))

Keywords:

p-type oxide,nickel oxide (NiO) thin films,rf sputtering,p-type NiO,RF magnetron sputtering