Session Details

[G4-P102]Poster 102

Tue. Dec 9, 2025 3:30 PM - 5:30 PM JST
Tue. Dec 9, 2025 6:30 AM - 8:30 AM UTC
Poster(G1+G2)

[G4-P102-01]Structural Changes of Y-Mg Alloy and Sm Hydride Thin Films during Gasochromic Hydrogenation Reaction Studied by In-Situ XRD/XRR

*Tetsuroh Shirasawa1, Yuichiro Yamashita1, Takashi Yagi1, Naoyuki Taketoshi1, Yuzo Shigesato2 (1. National Institute of Advanced Industrial Science and Technology (Japan), 2. Aoyama Gakuin Univ. (Japan))

[G4-P102-02]Carrier generation in p-type NiO films deposited by RF magnetron sputtering using a NiO target

*Mana Shibata1, Minseok Kim1, Isoa Tamai2, Yusuke Maeyama2, Yuki Oguchi1, Junjun Jia3, Yuzo Shigesato1 (1. Aoyama Gakuin Univ. (Japan), 2. Shindengen Electric Manufacturing Corp., Ltd. (Japan), 3. Waseda Univ. (Japan))

[G4-P102-03]In-situ thermophysical analysis on metal or insulator states of GdHx thin films controlled by reversible electrochemical hydro-/dehydrogenations

*Nanase Takahashi1, Yuichiro Yamashita1,2, Minseok Kim1, Yuki Oguchi1, Takashi Yagi1,2, Naoyuki Taketoshi1,2, Yuzo Shigesato1 (1. Aoyama Gakuin Univ. (Japan), 2. AIST (Japan))

[G4-P102-04]Thermal conductivity control of SmHx and Sm-Mg films by electrochemical hydro/dehydrogenations in KOH solution

*Kota Yamada1, Yuichiro Yamashita1,2, Minseok Kim1, Yuki Oguchi1, Takashi Yagi1,2, Naoyuki Taketoshi1,2, Yuzo Shigesato1 (1. Aoyama Gakuin Univ. (Japan), 2. AIST (Japan))

[G4-P102-05]Changes in electrical, optical and thermal properties of rf sputter-deposited NdNiO3 films induced by electrochemical hydro-/dehydrogenations

*An Okamoto1, Kaho Ikeda1, Yuichiro Yamashita1,2, Takashi Yagi1,2, Yuki Oguchi1, Minseok Kim1, Naoyuki Taketoshi1,2, Yuzo Shigesato1 (1. Aoyama Gakuin Univ. (Japan), 2. AIST (Japan))

[G4-P102-06]In-situ thermal and optical analyses of Pd-catalyzed Y–Mg alloy thin films during electrochemical hydro/dehydrogenations in KOH solution

*Shusei Nagane1, Hina Saito1, Yuichiro Yamashita1,2, Takashi Yagi1,2, Yuki Oguchi1, Minseok Kim1, Naoyuki Taketoshi1,2, Yuzo Shigesato1 (1. Aoyama gakuin Univ. (Japan), 2. AIST (Japan))

[G4-P102-07]Influence of attained vacuum pressure and N2 Introduction in the rf magnetron sputtering process to deposit p-type Cu2O films.

*Daichi Miyagi1, Minseok Kim1, Isao Tamai2, Yusuke Maeyama2, Yuki Oguchi1, Junjun Jia3, Yuzo Shigesato1 (1. Aoyama Gakuin Univ. (Japan), 2. Shindengen Electric Manufac. Corp. Ltd. (Japan), 3. Waseda Univ. (Japan))

[G4-P102-08]In-situ electrical, optical and thermal analyses on Pd-catalyzed Tix-Mg1-x alloy films under gasochromic hydro-/dehydrogenations

*Miyu Aoyama1, Yuichiro Yamashita2,1, Takashi Yagi2,1, Yuki Oguchi1, Minseok Kim1, Naoyuki Taketoshi1,2, Yuzo Shigesato1 (1. Aoyama Gakuin Univ. (Japan), 2. AIST (Japan))

[G4-P102-09]All solid-state thermal switchable devices consist of multilayer thin films including the Y-Mg alloy film controlled by hydro-/dehydrogenations.

*Yuzo Shigesato1, Ryuto Nishimura1, Yuki Oguchi1, Makoto Kashiwagi1 (1. Aoyama Gakuin Univ. (Japan))

[G4-P102-10]Growth of Spherulite-like GeS Thin Films on SiO2/Si Substrates

*Qinqiang Zhang1, Ryo Matsumura1, Naoki Fukata1,2 (1. NIMS (Japan), 2. Univ. of Tsukuba (Japan))

[G4-P102-11]Sputter Growth of GaN Thin Films Utilizing Bayesian Optimization

*Akinori Saito1, Riki Kanetake1, Taiki Kobayashi1, Naoomi Yamada1 (1. Chubu Univ. (Japan))

[G4-P102-12]Approaches to fabricate the high-performance all-solid state electrochromic windows

*Toranosuke Okubo1, Minseok Kim1, Yuki Oguchi1, Yuzo Shigesato1 (1. Aoyama Gakuin Univ. (Japan))

[G4-P102-13]Temperature dependence of the hydro-/dehydrogenation reaction kinetics on switchable mirror Y-Mg and YMgHx films

*Akihiro Murakami1, Kaiwen Zhu1, Minseok Kim1, Tadashi Suzuki1, Yuzo Shigesato1 (1. Aoyamagakuin Univ. (Japan))

[G4-P102-14]Experimental Investigation of Electronic Structure of GeS

*Zihan Lin1, Qingqiang Zhang2, Ryo Matsumura2, Naoki Fukata2,3, Junjun Jia1 (1. Waseda Univ. (Japan), 2. National Inst. for Materials Sci. (Japan), 3. Univ. of Tsukuba (Japan))

[G4-P102-15]Temperature dependence of the hydro-/dehydrogenation reaction processes of switchable mirror Ni-Mg films

*Masaru Mino1, Kaiwen Zhu1, Minseok Kim1, Tadashi Suzuki1, Yuzo Shigesato1 (1. Aoyamagakuin Univ. (Japan))

[G4-P102-16]Using Q-Switched Lasers for Multi-Beam Multi-Target Pulsed Laser Deposition of Photonic High-Entropy Alloy Films

*Abdalla M Darwish1, Sergey S. Sarkisov2, Darayas N. Patel3, Paolo Mele4, Givonna Latrino5 (1. Dillard University (United States of America), 2. SSS Optical Technologies (United States of America), 3. Oakwood University (United States of America), 4. SIT, Omiya Campus (Japan), 5. Institute: CNR-ICMATE (Italy))

[G4-P102-17]Radiation Hardness Dependence on Channel Thickness in Oxide Thin-film Transistors

*Dongil Ho1, Choongik Kim2 (1. Kongju National Univ. (Korea), 2. Sogang Univ. (Korea))

[G4-P102-18]Sputter epitaxy of low carrier density (ZnO)x(InN)1-x films on sapphire substrates using magnetron sputtering

*Shotaro Hata1, Satoshi Kumamoto1, Naoto Yamashita1, Kunihiro Kamataki1, Takamasa Okumura1, Kazunori Koga1, Masaharu Shiratani1, Naho Itagaki1 (1. Kyushu Univ. (Japan))

[G4-P102-19]Epitaxial growth behavior of (ZnO)x(InN)1-x thin films on sapphire with 3D island buffer layers

*Satoshi Kumamoto1, Shotaro Hata1, Naoto Yamashita1, Kunihiro Kamataki1, Takamasa Okumura1, Kazunori Koga1, Masaharu Siratani1, Naho Itagaki1 (1. Kyushu Univ. (Japan))

[G4-P102-20]Enhanced Reliability of SAW Filters Using SiOxNy Passivation Layers Fabricated by Reactive Sputtering

*Mingue Cha1, Jungcheol Lee2, Taekjoo Lee2, Seohan Kim1,3, Pungkeun Song1 (1. Pusan national Univ. (Korea), 2. SAWNICS Inc. (Korea), 3. The Ångström Lab. (Sweden))

[G4-P102-21]Graphene-Doped Inorganic Thermoelectric Thin Films for High-Selectivity Hydrogen Sensing: Fabrication and Performance Evaluation

*TANGYU LAI1, CHUNYU CHEN2, KUOCHIN HSU2 (1. R.O.C. Air Force Academy (Taiwan), 2. National Kaohsiung University of Science and Technology (Taiwan))

[G4-P102-22]Aqueous Solution Derived Nb-Doped Anatase TiO2 Coatings for Fuel Cell Separators

*Ayaka Nakamura1, Rento Naito1, Megumi Ariga1, Tomohito Sudare2, Ryo Nakayama2, Ryota Shimizu3, Taro Hitosugi2, Naoomi Yamada1 (1. Chubu Univ. (Japan), 2. Univ. Tokyo (Japan), 3. Inst. Mol. Sci. (Japan))

[G4-P102-23]Effect of Oxidant Addition on the Sterilizing Properties in Potassium Vanadate Glasses

*Hiroki Minegoshi1, Koki Hayashida1, Keiji Kaneyama1, Tetsuaki Nishida2, Nobuto Oka1 (1. Kindai Univ. (Japan), 2. Environmental Materials Inst. (Japan))

[G4-P102-24]Study on the Electrical Conductivity of Amorphous (In2O3)1(ZnO)2 Composite Oxide Films

*Keiji Kaneyama1, Junjun Jia2, Non Fujimoto1, Koki Hayashida1, Hiroki Minegoshi1, Tetsuaki Nishida3, Nobuto Oka1 (1. Kindai Univ. (Japan), 2. Waseda Univ. (Japan), 3. Environmental Materials Inst. (Japan))

[G4-P102-25]Tailoring Thermodynamic Stability and Mechanical Properties of Tantalum Diboride as Sustainable and Hard-Coating Material: A Theoretical Design

*Annop Ektarawong1, Kunpot Mopoung1, Chayanon Atthapak1, Thiti Bovornratanaraks1, Björn Alling2 (1. Chulalongkorn Univ. (Thailand), 2. Linköping Univ. (Sweden))