Presentation Information
[G4-P102-07]Influence of attained vacuum pressure and N2 Introduction in the rf magnetron sputtering process to deposit p-type Cu2O films.
*Daichi Miyagi1, Minseok Kim1, Isao Tamai2, Yusuke Maeyama2, Yuki Oguchi1, Junjun Jia3, Yuzo Shigesato1 (1. Aoyama Gakuin Univ. (Japan), 2. Shindengen Electric Manufac. Corp. Ltd. (Japan), 3. Waseda Univ. (Japan))
Keywords:
p-type oxide,Copper(I) oxide (Cu2O),rf sputtering,p-type Cu2O films,RF magnetron sputtering