Presentation Information
[G4-P102-18]Sputter epitaxy of low carrier density (ZnO)x(InN)1-x films on sapphire substrates using magnetron sputtering
*Shotaro Hata1, Satoshi Kumamoto1, Naoto Yamashita1, Kunihiro Kamataki1, Takamasa Okumura1, Kazunori Koga1, Masaharu Shiratani1, Naho Itagaki1 (1. Kyushu Univ. (Japan))
Keywords:
ZnO,InN,heteroepitaxy,buffer layer,sputtering