Presentation Information
[G4-P102-20]Enhanced Reliability of SAW Filters Using SiOxNy Passivation Layers Fabricated by Reactive Sputtering
*Mingue Cha1, Jungcheol Lee2, Taekjoo Lee2, Seohan Kim1,3, Pungkeun Song1 (1. Pusan national Univ. (Korea), 2. SAWNICS Inc. (Korea), 3. The Ångström Lab. (Sweden))
Keywords:
SAW device,SiOXNY,Reactive sputtering,dangling bond,uHAST