Presentation Information
[G4-P202-13]Direct Observation of Electron Trap States in SiO2 Gate Insulating Films Using Constant Final State Photoelectron Yield Spectroscopy
*Renjiro Shibuya1, Manato Tateno1, Tomohiro Ishibashi1, Runa Hoshikawa1, Hirohiko Fukagawa2,3, Hisao Ishii1,2,3 (1. Graduate School of Sci. and Eng., Chiba Univ. (Japan), 2. Center for Frontier Sci., Chiba Univ. (Japan), 3. Molecular Chirality Research Center, Chiba Univ. (Japan))
Keywords:
Photoelectron Spectroscopy,Insulator,Trap States,CFS-YS