Presentation Information
[G4-P202-23]Crystallization of amorphous WO3 films deposited by RF sputtering
*Koki Hayashida1, Ayaka Fukuchi1, Junjun Jia2, Keiji Kaneyama1, Hiroki Minegoshi1, Tetsuaki Nishida3, Nobuto Oka1 (1. Kindai Univ. (Japan), 2. Waseda Univ. (Japan), 3. Environmental Materials Institute (Japan))
Keywords:
sputtering,tungsten oxide,crystallization mechanism