Presentation Information
[G4-P202-27]Optical and structural properties of TiOxNy thin films deposited by High-Power Impulse Magnetron Sputtering (HiPIMS)
*Minseok Kim1, Yuta Asano1, Kaisei Oku1, Masayoshi Katagiri2, Hironobu Machinaga2, Yuzo Shigesato1 (1. Aoyama Gakuin Univ. (Japan), 2. Nitto Denko Corp. (Japan))
Keywords:
TiO2,HiPIMS,AR-coating,titanium oxynitride (TiOxNy),spectroscopic ellipsometry